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DLPR410 数据表(PDF) 12 Page - Texas Instruments

部件名 DLPR410
功能描述  DLP650LNIR 0.65 NIR WXGA S450 DMD
PDF  53 Pages
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制造商  TI2 [Texas Instruments]
网页  https://www.ti.com
标志 TI2 - Texas Instruments

DLPR410 数据表(HTML) 12 Page - Texas Instruments

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0/100
100/0
30
5/95
95/5
40
50
60
70
80
10/90
90/10
15/85
85/15
20/80
80/20
25/75
75/25
30/70
70/30
35/65
65/35
40/60
60/40
45/55
55/45
50/50
50/50
Micromirror Landed Duty Cycle
12
DLP650LNIR
DLPS136 – NOVEMBER 2018
www.ti.com
Product Folder Links: DLP650LNIR
Submit Documentation Feedback
Copyright © 2018, Texas Instruments Incorporated
(1)
The DMD is designed to conduct absorbed and dissipated heat to the back of the package. The cooling system must be capable of
maintaining the package within the temperature range specified in the Recommended Operating Conditions.
The total heat load on the DMD is largely driven by the incident light absorbed by the micromirrror array, although other contributions
include light energy outside of the active mirror array and electrical power dissipation of the silicon.
Design the optical system to minimized light outside of the active micromirror array because light outside of this area gets highly
absorbed by the optical border and increases DMD heat load.
Design the optical system to minimize the light energy falling outside the window clear aperture. Aditional thermal load in this area
contributes to window heating and significantly degrades the reliability of the device.
Figure 2. Maximum Recommended Micromirror Temperature - Derating Curve (see Landed Duty Cycle
and Operational DMD Temperature)
6.5 Thermal Information
THERMAL METRIC
DLP650LNIR
UNIT
FYL Package
149 PINS
RSILICON-TO-CERAMIC: Thermal resistance, silicon to ceramic, as measured at test point 1 (TP1)
(1)
0.5
°C/W
RMIRROR-TO-SILICON: Thermal resistance, mirror to silicon, per individual mirror
(1)
3.39 × 105
°C/W



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