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HTMS1301FUG/AM 数据表(PDF) 6 Page - NXP Semiconductors |
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HTMS1301FUG/AM 数据表(HTML) 6 Page - NXP Semiconductors |
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6 / 44 page ![]() 184430 All information provided in this document is subject to legal disclaimers. © NXP B.V. 2010. All rights reserved. Product data sheet PUBLIC Rev. 3.0 — 18 March 2010 184430 6 of 44 NXP Semiconductors HITAG µ ISO 18000 transponder IC 7.1.5 Au bump • Bump material: > 99.9% pure Au • Bump hardness: 35 – 80 HV 0.005 • Bump shear strength: > 70 MPa • Bump height: 18 μm • Bump height uniformity: – within a die: ± 2 μm – within a wafer: ± 3 μm – wafer to wafer: ± 4 μm • Bump flatness: ± 1.5 μm • Bump size: – LA, LB 294 x 164 μm – TEST, GND, VDD 60 x 60 μm – Bump size variation: ± 5 μm • Under bump metallization: sputtered TiW 7.1.6 Fail die identification No inkdots are applied to the wafer. Electronic wafer mapping (SECS II format) covers the electrical test results and additionally the results of mechanical/visual inspection. See Ref. 2 “General specification for 8” wafer on UV-tape with electronic fail die marking”. 7.1.7 Map file distribution See Ref. 2 “General specification for 8” wafer on UV-tape with electronic fail die marking”. |
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